Quartz glass is cost-effective compared to sapphire (much higher price) or alumina ceramics (similar but opaque). While more expensive than borosilicate, its superior performance in high-temperature, UV, and purity-critical applications often justifies the investment—leading to longer service life and reduced downtime in fabs and labs. Request a quote from FGQuartz for your specific volume and specs.
Excellent chemical inertness—resistant to most acids (except HF and hot phosphoric), bases, salts, and organic solvents. It shows virtually no corrosion or leaching, making it perfect for chemical processing, labware, semiconductor wet benches, and high-purity environments where contamination must be avoided.
Yes – we offer a full range of CNC machining, flame polishing, precision grinding, drilling, ultrasonic cutting, welding, and annealing services for custom quartz parts. From simple tubular/rod stock to complex components with extremely tight tolerances (±0.01 mm), our factory in China (serving global clients) ensures rapid prototyping and production to meet the needs of the optics, semiconductor, and scientific research sectors.
Semiconductor-grade fused quartz typically requires ≥99.995% SiO₂, with total metals <20 ppm, OH <10 ppm, and alkali metals <5 ppm to minimize contamination in wafer processing. FGQuartz’s material meets or exceeds these specs for quartz boats, tubes, tanks, and furnace liners used in diffusion, oxidation, and annealing processes.
Absolutely. With transmission >90% from 185 nm (deep UV) to 2500 nm (near-IR), low absorption, and minimal fluorescence, our high-purity quartz glass is widely used for UV lamps, excimer lasers, lithography optics, spectroscopy cells, and optical windows. FGQuartz supplies custom UV-grade quartz components globally.
Outstanding—due to its ultra-low thermal expansion coefficient (≈0.55 × 10⁻⁶/°C), fused quartz can withstand rapid changes (e.g., from 1100°C to room temperature) without cracking. This makes it ideal for diffusion furnaces, rapid thermal processing (RTP), and high-temperature cycling in semiconductor manufacturing and photovoltaic applications.
Always handle with clean gloves to avoid fingerprints/oils. Clean with deionized water, isopropyl alcohol, or mild detergents; for critical applications, use 7-10% ammonium bifluoride solution (max 10 minutes) followed by thorough rinsing. Avoid sudden temperature shocks (though quartz excels at thermal shock resistance), scratches, and HF exposure unless intentional etching. Proper care extends lifespan in semiconductor and lab environments.
Yes—”fused quartz”, “quartz glass”, and “fused silica glass” are often used interchangeably in industry. They refer to high-purity amorphous SiO₂ material with exceptional thermal, optical, and chemical properties. At FGQuartz, our quartz glass products are engineered for semiconductor fabs, optical systems, and high-temperature processes worldwide.
Quartz glass excels in UV transmission, thermal shock resistance, ultra-low thermal expansion, and cost-effectiveness. Sapphire offers higher temperature resistance (~1800°C) but has much higher thermal expansion, poorer UV transmission, and significantly higher cost. Alumina ceramic withstands high temperatures but is opaque and has higher expansion. Quartz is usually the preferred choice for semiconductor and optical applications.
Bending strength (20°C) ≈67 MPa, tensile strength ≈48 MPa, Young’s modulus 72 GPa. It has high hardness (Mohs 5.5–6.5) but is a brittle material—care must be taken to avoid impact and localized stress concentrations during handling and use.
Outstanding UV to near-IR transmission (185–2500 nm, >90% in key bands), refractive index ≈1.4585 at 589 nm, very low scattering and absorption. It is highly suitable for optics, lasers, UV lithography, high-end spectroscopy, and photolithography applications.
Quartz glass (≥99.99% SiO₂ purity) offers significantly higher temperature resistance (continuous use up to ~1200°C, short-term ~1300°C), an extremely low coefficient of thermal expansion (~0.55 × 10⁻⁶/°C), excellent UV transmission, superior chemical stability, and virtually no metal contamination. Borosilicate glass typically withstands only ~500°C continuous use, has a higher thermal expansion (~3.3 × 10⁻⁶/°C), and is better suited for general laboratory ware rather than semiconductor, high-temperature, or precision optical applications.
Standard stock products have shorter lead times depending on inventory. For custom quartz glass components, lead times are usually 3 to 6 weeks, depending on part complexity, tolerance requirements, processing steps (CNC machining, flame working, precision grinding, polishing, drilling, etc.), and order quantity. Small prototype runs can often be faster, while large-volume production may take longer.
Yes. FGQuartz specializes in custom fused quartz manufacturing. We offer precision machining, specified dimensions, specialty coatings, and unique geometries. Capabilities include custom tubing (specific diameter/wall combinations), non-round rods, precision-ground plates, and complex assemblies. Our engineering team works closely with customers from design validation through to full production.
Primarily in semiconductors (diffusion/oxidation furnaces, quartz boats/carriers), optoelectronics/optics (UV/laser windows, lenses), laboratory instruments, high-temperature experimental equipment, photovoltaics, LEDs, optical fibers, and other fields requiring ultra-purity, extreme temperature resistance, or chemical inertness.
Continuous maximum working temperature is approximately 1200°C, short-term up to 1300°C. Softening point ≈1680°C, annealing point ≈1215°C, strain point ≈1120°C. It is excellent for rapid thermal cycling from 1100°C to room temperature without cracking, due to its very low thermal expansion.
We use ultra-high-purity natural quartz crystal raw materials with SiO₂ content ≥99.99%. Total metallic impurities <20 ppm, OH content <10 ppm, Na+K <5 ppm, Fe <5 ppm, Al <10 ppm. This makes our material ideal for semiconductor, optical, and high-temperature contamination-free applications.