Resistant to HF and HCl Mixed Acid – Ideal for Semiconductor Wet Cleaning
In semiconductor manufacturing, metal contamination can severely impact wafer yield and performance. High-purity quartz glass cleaning tanks are essential for removing metal ions from silicon wafers during wet cleaning processes. Our quartz tanks are specially engineered to resist hydrofluoric acid (HF), hydrochloric acid (HCl), and their mixed acid solutions, ensuring safe, effective decontamination in ultra-clean environments.
1. Why Use Quartz Tanks for Wafer Cleaning?
- Quartz is the preferred material in advanced wafer cleaning due to its:
- Chemical resistance: withstands strong acids, including HF and HCl
- Ultra-high purity: avoids introducing metallic or particle contaminants
- Thermal stability: operates safely under elevated temperatures (up to 1200°C)
- Smooth, non-reactive surface: prevents unwanted reactions with cleaning chemicals
- These features make quartz tanks ideal for RCA cleaning, SC-1/SC-2, and HF/HCl mixed acid processing in wafer fabs and labs.
2. Application: Removing Metal Contamination from Wafers
- Our quartz cleaning tanks are designed for key processes such as:
- SC-2 Cleaning (HCl + H₂O₂)
- Removes metal ions like Fe, Cu, and Zn from wafer surfaces
- Quartz tanks resist aggressive HCl/peroxide mixtures and thermal cycling
- HF Cleaning (Dilute or Mixed HF/HCl)
- Effective in oxide layer removal and native oxide stripping
- Quartz ensures purity and stability during acid exposure
- Gold/Aluminum Decontamination
- Used in post-CMP or back-end cleaning to remove conductive residue
- Quartz tanks offer non-contaminating, inert processing surfaces
3. Product Features – High-Purity Quartz Cleaning Tanks
- Material: 99.99% high-purity quartz glass is used, which is suitable for clean room-level manufacturing requirements.
- Acid and alkali tolerance: It has excellent resistance to HF (hydrofluoric acid), HCl (hydrochloric acid), HNO₃ (nitric acid) and mixed acid, and is suitable for various wet cleaning processes.
- High temperature resistance: It can be used for a long time at 1200°C, and can withstand temperatures up to 1450°C for a short time, ensuring the stability of the high-temperature cleaning process.
- Structural design: It supports customized single-slot and double-slot, with or without cover, suitable for manual or automatic cleaning systems.
- Inner wall treatment: The inner surface can be polished or fire-polished to improve the fluidity of the cleaning liquid and reduce residue.
4. Customization Options
- We support custom fabrication based on your process needs:
- Tank dimensions (length, width, depth)
- Integrated overflow drains or lifting slots
- Compatibility with robotic wafer handling systems
- Dual-tank systems for HF-HCl separation
5. Why Choose Us?
✅ Over 20 years of experience in quartz fabrication
✅ Direct factory pricing & global shipping
✅ Custom engineering to match specific wafer fab processes
✅ Proven acid resistance in real-world semiconductor fabs
✅ Fast lead times & responsive customer service
6. Frequently Asked Questions (FAQs)
Q1: Will quartz cleaning tanks resist repeated HF/HCl exposure?
Yes. Our quartz tanks are manufactured from acid-resistant fused silica, proven to withstand repeated exposure to HF, HCl, and mixed acids at elevated temperatures.
Q2: Can quartz tanks be used in automated wet stations?
Absolutely. We offer custom tank designs that integrate easily into automated wafer cleaning systems or robotic handlers.
Quartz cleaning tanks are essential tools in modern semiconductor wafer cleaning, offering unmatched purity, chemical resistance, and thermal stability. Whether you are processing wafers in HF/HCl mixed acid, SC-2, or other cleaning steps, our high-purity quartz tanks deliver the performance and reliability your cleanroom demands.
Contact us today for a quote or consultation on custom quartz acid tanks.
